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Re: Negative Etch (Was Re: gEDA-user: PCB manual routing)

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Subject: Re: Negative Etch (Was Re: gEDA-user: PCB manual routing)
From: DJ Delorie <dj@xxxxxxxxxxx>
Date: Fri, 22 Dec 2006 19:37:10 -0500
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> "Expose with UV through negative film, develop with Sodium
> Bicarbonate desolved in water, and strip with liquid drano desolved
> in water."
> 
> I am uninitiated in Negative film and usually use positive
> MGChemicals boards. The way written, it is implied that the strip
> step takes place bewteen develop and etch.  Is this the case?

It reads to me "expose, develop, strip".  Isn't that always the way
with photoresist?


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Follow-Ups:
- Re: Negative Etch (Was Re: gEDA-user: PCB manual routing)
  - From: John Griessen

References:
- gEDA-user: PCB manual routing
  - From: Tuck Hartshorn
- Re: gEDA-user: PCB manual routing
  - From: DJ Delorie
- Re: gEDA-user: PCB manual routing
  - From: Tuck Hartshorn
- Negative Etch (Was Re: gEDA-user: PCB manual routing)
  - From: Lares Moreau

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